Contributed Papers
Participants are encouraged to submit 2 page extended abstracts before April 16, 2008. Papers must be written in English.
Each participant is invited to prepare – beside an extended abstract – regular paper, which will be considered for publication in a special conference issue of journal Chemicke listy with impact factor 0.5. Authors of are requested to submit their papers as camera-ready electronic files by August 30, 2008 or bring the papers with them and submit them personally during the symposium. The editors (to be selected from organizing and scientific committees) will provide a peer review procedure for submitted papers.
The extended abstracts and regular papers should be submitted by e-mail to the conference address:
Please note your registration number in the e-mail.
Templates
Download:
Topics
- Plasma sources, plasma reactors
- Diagnostics of plasma processes
- Modelling of plasmachemical processes
- Plasma processes at atmospheric pressure
- Chemical plasma synthesis
- Plasma reforming
- Plasma for surface cleaning and modification
- Plasma and thin layers
- Plasma in nanotechnology
- Plasma in microelectronics and photonics
- Plasma in medicine, biology and environment protection
- Application of plasma processes in industry
- Generation and dynamics of plasma flows
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